Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/4760
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dc.contributor.authorФреїк, Дмитро Михайлович-
dc.contributor.authorПрокопів, Володимир Васильович-
dc.contributor.authorНич, Андрій Богданович-
dc.contributor.authorШепетюк, Володимир Андрійович-
dc.contributor.authorТітова, Любов Василівна-
dc.date.accessioned2020-04-09T14:27:50Z-
dc.date.available2020-04-09T14:27:50Z-
dc.date.issued1997-
dc.identifier.citationMaterials Science and Engineering B48 (1997) 226-228uk_UA
dc.identifier.urihttp://hdl.handle.net/123456789/4760-
dc.description.abstractWe have determined the technological factors in the hot wall technique that determine the conditions of PbTe thin films with pre-assigned parameters. We have proposed the model that describes the processes of growth of PbTe thin films from the vapour phase. The general equations, that set the connection between the charge carriers concentration (I1), inversion (n-p transition) temperature (T*) of precipitation, evaporation temperature (T~) of the sample, the pressure of the vapour of the components (PTe) and condensation temperature (T~) have been obtained. We have shown that the formation of defects like PbTei + - V2g - is predominant in PbTe thin films grown from the vapour phase.uk_UA
dc.language.isoenuk_UA
dc.relation.ispartofseriesMaterials Science and Engineering B;48(2) 226-228 (1997)-
dc.subjectDirected synthesis; PbTe; Hot wall techniqueuk_UA
dc.titleDirected synthesis and formation of the defects in thin films PbTeuk_UA
dc.title.alternativeСтаттяuk_UA
dc.typeArticleuk_UA
Appears in Collections:Статті та тези (ФТФ)

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